TenderSemiconductors and electronics
CEA seeks electron-beam lithography system for Gif-sur-Yvette site
The six-year supply contract bundles delivery, installation, training and maintenance, with technical scoring for dense-pattern resolution, stitching, overlay and throughput.
- Event
- First published on EPC Feed
- Sources
- 1 listed below
- Reading time
- 2 min
CEA Paris-Saclay has opened a procurement for an electron-beam lithography system to be supplied and commissioned at Gif-sur-Yvette. The scope covers factory checks and testing, packing and delivery to CEA’s premises, installation and commissioning, and testing at the site. The supplier must also provide documentation needed to operate, maintain and service the equipment, and train users. The stated contract horizon is 72 months.
The notice sets out a one-year equipment warranty beginning at acceptance. That warranty includes supplying and replacing the filament if necessary and one preventive-maintenance visit. A three-year maintenance period follows the warranty. It includes annual preventive visits, software updates for the equipment’s control system, telephone support and filament replacement when needed. The procurement therefore covers more than the initial instrument purchase: installation, knowledge transfer and multiple years of support are part of the defined package.
Three options are listed. Option 1 is software for proximity-effect correction and advanced pattern preparation. Option 2 is supply and installation of a thermal-regulation device, with sub-options for a one-year warranty and maintenance arrangements. Option 3 is unlimited corrective maintenance for three years after the equipment warranty ends. Because options are distinct from the firm scope, bidders should distinguish the priced base requirement from the additional services and equipment in their proposals.
The buyer’s scoring design gives price 40 points and technical criteria 60 in total. Technical performance is worth 30 points and covers compliance with specifications, resolution and precision on dense patterns, stitching, overlay, and throughput or production capacity. After-sales service earns 10 points based on response times during warranty, maintenance and separately quoted services. The interface and software environment accounts for 20 points. The criterion structure makes operating capability and ongoing service a substantial part of the evaluation, while the price score is calculated on the firm scope, option 2 and a scenario concerning the estimate-based portion.
CEA’s notice classifies the purchase as a supply contract under an open procedure. It does not state a total budget or identify the instrument’s manufacturer, beam energy, wafer or substrate size, resolution target or intended research application. Those technical particulars are not supplied here. The published deadline is 24 November 2026 at 16:00 (+01:00). Interested suppliers should consult the procurement documents for the full performance specification, interface requirements, acceptance tests and the exact commercial treatment of the options.
The 72-month contract duration is longer than the specifically described one-year warranty and three-year maintenance period. The notice does not explain the remaining two years of the contract horizon, so bidders need to check the draft contract and delivery schedule for how the term applies after the stated maintenance period. It does not publish an estimated contract value. The listed technical and service criteria, options and acceptance obligations provide the available procurement detail; no equipment model or research use is named.
Sources
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